NDE Mask Manufacturable Suite
for Mask Data
NDE Mask Manufacturable Suite is a software which offers applications required by mask data preparation.
Technical papers
The followings are the technical papers of NDE Mask Manufacturable Suite.
Contact us if you would like a manuscript.
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Practical challenges of Bezier curves in mask data preparation
Photomask Technology 202412 November 2024
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PEC parameter optimization for EUV short-range effect utilizing MPC model calibration techniques
Photomask Technology 202412 November 2024
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PEC-aware MPC for CD quality improvement
Photomask Technology 202321 November 2023
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Improvements on pattern fidelity at high curvature region of curvilinear mask with a novel method of MPC
Photomask Technology 202321 November 2023
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The impact of real curve layout in mask data preparation
Photomask Japan 202329 September 2023
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New multi-beam mask data preparation method for EUV high volume data
Photomask Japan 202329 September 2023
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File formats for curvilinear multi-beam writing of 193i and EUV masks
Photomask Technology 202112 October 2021
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Model based mask process correction for EUV Mask
Photomask Japan 202123 August 2021
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Mask contribution to OPC model accuracy
Extreme Ultraviolet Lithography 202013 October 2020
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Free form data reduction for MPC
Photomask Technology 202020 September 2020
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Applying MPC for EUV mask fabrication
Photomask Technology 20183 October 2018
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Manufacturing challenges for curvilinear masks
Photomask Technology 201716 October 2017
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OPC care-area feedforwarding to MPC
Photomask Technology 20164 October 2016
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Mask process simulation for mask quality improvement
Photomask Technology 201523 October 2015
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General shot refinement technique on fracturing of curvilinear shape for VSB mask writer
Photomask Technology 20148 October 2014
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MDP challenges from a software provider’s perspective
Photomask Technology 20148 October 2014
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Novel fracturing algorithm to reduce shot count for curvy shape
Photomask Technology 20139 September 2013