NDE Mask Manufacturable Suite
for Mask Data
マスクデータ準備 (MDP) で必要とされるアプリケーションを統合したソフトウェアシステムです。
技術資料
NDE Mask Manufacturable Suite に関する技術資料です。
原稿をご希望の場合は当社へお問い合わせください。
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File formats for curvilinear multi-beam writing of 193i and EUV masks
Photomask Technology 202112 October 2021
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Model based mask process correction for EUV Mask
Photomask Japan 202123 August 2021
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Mask contribution to OPC model accuracy
Extreme Ultraviolet Lithography 202013 October 2020
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Free form data reduction for MPC
Photomask Technology 202020 September 2020 -
Applying MPC for EUV mask fabrication
Photomask Technology 20183 October 2018
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Manufacturing challenges for curvilinear masks
Photomask Technology 201716 October 2017
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OPC care-area feedforwarding to MPC
Photomask Technology 20164 October 2016
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Mask process simulation for mask quality improvement
Photomask Technology 201523 October 2015 -
General shot refinement technique on fracturing of curvilinear shape for VSB mask writer
Photomask Technology 20148 October 2014 -
MDP challenges from a software provider’s perspective
Photomask Technology 20148 October 2014 -
Novel fracturing algorithm to reduce shot count for curvy shape
Photomask Technology 20139 September 2013