Nippon Control System offers systems including EDA, image processing and communication control.

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PATACON PC-cluster | for EPL | for LEEPL | for EBDW

PATACON PC-cluster For EBDW is a software product for converting semiconductor mask design data to EB Direct Writing data.

It has aperture extraction function for cell exposure and proximity effect collection, in addition to its conventional fracturing functions for photomask data.

- Use 1 cell as single aperture.
- Divide 1 cell and register two(or more) apertures.

- Make aperture definition data from pattern repetition in design data.
- A repetition composed of several pattern types can be extracted as one aperture, to the extent that its size does not exceed aperture mask size.
- Hole patterns and large patterns (whose size exceeds aperture mask size) are out of the scope of this processing.
- The extraction results are output to the number of aperture max, from well-matched data to less.
- It is possible to classify design data into "target" and other part in advance and perform extraction only to "target".

- The matching process can be performed to all patterns or to only pattern repetitions.
- When the line attribute of aperture pattern is "TOUCH", it is possible to divide target pattern for matching.
- It is possible to classify design data into "target" and other part in advance and perform matching process only to "target".

- Calculate backscattered energy based on pattern density in a mesh and perform dose control.
- When area density of one mesh is greatly different from that of the neighboring meshes, shots in the mesh are divided.