Nippon Control System offers systems including EDA, image processing and communication control.

PRODUCTS > EDA systems

PATACON PC-cluster | for EPL | for LEEPL | for EBDW

PATACON PC-cluster is a software product for converting semiconductor mask design data to EB data for mask writers.

This system operates established PATACON software on a general-purpose Linux PC, and moreover operates several to some hundreds of Linux PC's in the environment connected by a high-speed network. This allows processing largescale LSI mask data in a short time.

PATACON PC-cluster operates established PATACON mask fracturing software on a general-purpose Linux PC, and moreover operates several to some hundreds of Linux PC in a cluster environment connected by a high-speed network. Processing speed is almost proportional to the number of the Linux PC's by using the NCS's own parallel processing technology, which has been developed for long years.

This system can support CAD data and EB data for LSI whose scale of integration grow dramatically. Some hundred gigabytes of CAD data and EB data can be processed.

Writing quality and writing speed are greatly influenced by the way of pattern decomposition in the writing strategies of electron beam writers. This system aims at high-quality high-speed writing by making a close collaboration with users. This system corresponds to the downsizing of mask patterns that will progress increasingly and particularly emphasizes the small-figure treatment.

This system compacts data automatically when outputting converted EB data. A library is automatically generated not only for MEBES output but also JEOL52V1.0/V1.1/V3.0/V3.1 output, HL-700/800/900/7000 output and VSB11/12 output, so that data are automatically compacted without getting help from someone.

For writers with a cell projection exposure function, this system is equipped with a function for extracting patterns from pattern data, which are put on the aperture mask.

Since this system performs highly reliable processing for data including arbitrary angles and other complicated figures, you can use this system for mask manufacturing at ease.

PATACON PC-cluster can execute more than one job simultaneously. In addition, the priority of each job can be changed or aborted even while a job is being executed.

For displaying input and output data, this system has a variety of display functions such as outline display, paint-out display, magnification/reduction display, display of overlaid layers, small-figure display, grid display, and line-width measurement with the cursor. It is the merit of these functions that extensive data can be displayed rapidly.

This system counts the number of jobs, processing time (entry, operation, and output), the number of figures, data volume, operating time, down time, and availability in the form of daily report, weekly report, and monthly report. In addition, this system can also count information on a specified job. You can grasp operation status and get information for accounting by this function.

The specification of required user interface varies considerably according to the objectives of the system use and operation form. This system is equipped with standard window interface, however, NCS develops customized interface as well. In addition, NCS develops an automatic generation tool of command files.

Plenty utility programs are available, for example data analysis tools for GDS-II, MEBES, JEOL52V1.0/V1.1/V3.0/V3.1, HL-700/800/900/7000 and VSB11/12.