Performance improvement, acceleration, and miniaturization of information technology instrument such as personal computer and portable small instrument are evolving year by year. Similarly, concerning miniaturization and high capacity of HDD, more than 1TB/in2 bit density is required today.
Medium noise would be a problem in high density magnetic media, but it is possible to reduce this noise by patterned media technology that separates neighboring bit physically.
NCS Formatter (FMTR-1000) is a formatter system for next generation HDD patterned media template drawing, supports BPM format template drawing by rotary stage EB writer, and supports high precise drawing.
NCS Formatter has high speed and high precise signal output by digital circuit based on standard clock. It can reduce signal output jitter because it doesn't need PLL management with encoder pulse and apply to various drawing ways by calculating signal length on software.
You can generate drawing pattern for BPM by setting easy parameter of servo information. NCS Formatter supports each kind of servo pattern, multi zone, and variable track pitch and could support new servo pattern by updating software.
Viewer function has two mode, template whole display and sector magnified display. You can confirm servo pattern and skew after setting servo information and confirm drawing image by executing Proximity Effect Simulation function on viewer.
NCS Formatter has EB Proximity Effect Simulation and Correction function for the template drawing.
You can confirm pattern shape and contrast by the simulation function.
And it supports Proximity Effect Correction by resizing drawing pattern and control of stage radial speed.
NCS Formatter consists of controller personal computer and formatter unit.
This is viewer function that enables to confirm servo pattern and skew before drawing. It has Template Display Mode that display disk arranged circularly and Sector Display Mode that display disk arranged horizontally. You can magnify smoothly.
It calculates the most suitable parameter for each pattern by calculating deposition energy of exposure path of spot beam. It corrects each pattern by bias and resizing. And it supports correction by control of stage radial speed.